The adsorption of oxygen on ZnO was monitored by measuring the capacit
ance of two contacting crystals which have depletion layers originated
from the interaction between oxygen and ZnO at 298 K-473 K. An admiss
ion of oxygen to the sample induced an irreversible increase in the de
pth and the amount of adsorbed oxygen was less than 0.001 monolayer in
the experimental condition. The relation between pressure of oxygen a
nd variation of the depth was tested from the view point of Langmuir o
r Freundlich isotherm: Using Hall effect measurement and kinetic exper
iment, a model equation on the adsorption process was proposed. From t
he results, it was suggested that oxygen adsorption depended on the ra
te of electron transfer from ZnO to oxygen while the amount of adsorbe
d oxygen was kinetically restricted by the height of surface potential
barrier.