We report on photoinduced defect creation on the sulfurized (100) GaAs
surface. The process manifests itself by unrecoverable temporal decre
ase in the photoluminescence intensity of the GaAs surface treated by
(NH4)(2)S-x solution. The results are discussed in terms of a photoind
uced process of the As-Ga antisite generation on the sulfurized surfac
e of GaAs.