MODIFICATION OF HEAT AND MASS TRANSFERS AND THEIR EFFECT ON THE CRYSTAL-MELT INTERFACE SHAPE OF SI SINGLE-CRYSTAL DURING CZOCHRALSKI CRYSTAL-GROWTH

Citation
M. Watanabe et al., MODIFICATION OF HEAT AND MASS TRANSFERS AND THEIR EFFECT ON THE CRYSTAL-MELT INTERFACE SHAPE OF SI SINGLE-CRYSTAL DURING CZOCHRALSKI CRYSTAL-GROWTH, JPN J A P 1, 36(10), 1997, pp. 6181-6186
Citations number
15
Volume
36
Issue
10
Year of publication
1997
Pages
6181 - 6186
Database
ISI
SICI code
Abstract
The modification of heat transfer in molten silicon during Czochralski (CZ) crystal growth is discussed by focusing on the transition of the flow mode from axisymmetric to nonaxisymmetric, in order to clarify t he mechanism of crystal-melt interface shape deformation. Heat transfe r in silicon melt is observed by measuring the difference in temperatu re near the crucible wall and at the crystal-melt interface with simul taneous observation of molten silicon flow. We confirm that the heat t ransfer coefficient of silicon melt is reduced when the flow mode is c hanged from axisymmetric to non-axisymmetric. The crystal-melt interfa ce shape changed as a result of the modified heat transfer, which is d ue to the flow mode transition from axisymmetric to non-axisymmetric.