N. Kumagai et al., INTERCALATION OF LITHIUM IN RF-SPUTTERED VANADIUM-OXIDE FILM AS AN ELECTRODE MATERIAL FOR LITHIUM-ION BATTERIES, Journal of Applied Electrochemistry, 28(1), 1998, pp. 41-48
Vanadium oxide films were prepared by r.f.-sputtering using an argon s
putter gas and a V2O5 target. The films were characterized by scanning
electron microscopy, atomic force microscopy, X-ray diffraction, X-ra
y photoelectron spectroscopy and electrochemical techniques. The oxide
film as deposited is amorphous; they are heat-treated in the range 30
0-700 degrees C in oxygen atmosphere and are composed of orthorhombic
V2O5 crystals. At higher heat-treatment temperatures (600-700 degrees
C) the crystallization of the oxide proceeded significantly with ab-di
rection parallel to the substrate. The oxide film undergoes a reversib
le lithium intercalation and deintercalation process. The kinetics of
the intercalation process of lithium into amorphous V2O5 film was stud
ied using an a.c. impedance method. Furthermore, a rocking-chair type
V2O5 film/LixV2O5 film cell could be charge-discharge cycled over 300
times at a current of 10 mu A at 25 degrees C.