A passive micro strain gauge with a mechanical amplifier has been desi
gned, analyzed, and tested, The mechanical amplifier provides a high g
ain such that residual strain in thin films can be directly measured u
nder an optical microscope, This strain gauge can be in situ fabricate
d with active micro sensors or actuators for monitoring residual strai
n effects, and both tensile and compressive residual strains can be me
asured via the strain gauge, It is shown that a very fine resolution o
f 0.001% strain readouts cad be achieved for a micro strain gauge with
a 500-mu m-long indicator beam, Beam theories have been used to analy
ze the strain gauge with a mechanical amplifier, and the results were
verified by a finite-element analysis. Experimental measurements of bo
th polysilicon and silicon-riched silicon-nitride thin films fabricate
d by surface micromachining processes are presented.