ANISOTROPIC INTERFACIAL STRAIN IN INP INGAAS/INP QUANTUM-WELLS STUDIED USING DEGREE OF POLARIZATION OF PHOTOLUMINESCENCE/

Citation
B. Lakshmi et al., ANISOTROPIC INTERFACIAL STRAIN IN INP INGAAS/INP QUANTUM-WELLS STUDIED USING DEGREE OF POLARIZATION OF PHOTOLUMINESCENCE/, Journal of applied physics, 81(8), 1997, pp. 3616-3620
Citations number
30
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
81
Issue
8
Year of publication
1997
Part
1
Pages
3616 - 3620
Database
ISI
SICI code
0021-8979(1997)81:8<3616:AISIII>2.0.ZU;2-Y
Abstract
Room-temperature, polarization-resolved photoluminescence from a (001) surface has been used to investigate InP/mGaAs/InP quantum wells grow n by gas source molecular beam epitaxy. The degree of polarization of photoluminescence from a (001) surface, DOP001, is a direct measure of the anisotropy of polarization of luminescence between [110] and [1(1 ) over bar0$] directions, DOP001 is observed to be strongly dependent on the quantum well thickness, composition (strain), and the gas switc hing time at the growth-interrupted interface. Results show that the a nisotropy of polarization may be due to an effect of an anisotropic st rain field that is associated with strained bonds at the interfaces of the quantum well. (C) 1997 American Institute of Physics.