NANOMETER DEFINITION OF ATOMIC-BEAMS WITH MASKS OF LIGHT

Citation
R. Abfalterer et al., NANOMETER DEFINITION OF ATOMIC-BEAMS WITH MASKS OF LIGHT, Physical review. A, 56(6), 1997, pp. 4365-4368
Citations number
27
Journal title
ISSN journal
10502947
Volume
56
Issue
6
Year of publication
1997
Pages
4365 - 4368
Database
ISI
SICI code
1050-2947(1997)56:6<4365:NDOAWM>2.0.ZU;2-M
Abstract
We build amplitude, i.e., absorptive masks, for neutral atoms using li ght, reversing the roles of light and atoms as compared to conventiona l optics. These masks can be used both to create and to probe spatiall y well-defined atomic distributions. The resolution of these masks can be significantly better than the optical wavelength. Applications ran ge from atom lithography to fundamental atom optical experiments. [S10 50-2947(97)50412-4].