The degradation and recovery behavior of strained Si1-xGex diodes and
heterojunction bipolar transistors (HBTs) irradiated by protons are st
udied. The degradation of device performance and the generation of lat
tice defects are reported as a function of fluence and also compared e
xtensively with previous results obtained on electron and neutron irra
diated devices. The radiation source dependence of the degradation is
discussed taking into account the number of knock-on atoms and the non
ionizing energy loss (NIEL). (C) 1997 Elsevier Science Ltd.