SURFACE MODIFICATION OF INAS(110) SURFACE BY LOW-ENERGY ION SPUTTERING

Citation
V. Martinelli et al., SURFACE MODIFICATION OF INAS(110) SURFACE BY LOW-ENERGY ION SPUTTERING, Surface science, 391(1-3), 1997, pp. 73-80
Citations number
31
Journal title
ISSN journal
00396028
Volume
391
Issue
1-3
Year of publication
1997
Pages
73 - 80
Database
ISI
SICI code
0039-6028(1997)391:1-3<73:SMOISB>2.0.ZU;2-M
Abstract
Sputter-induced electronic stales and stoichiometry at the low ion-ene rgy sputter-annealed InAs(110) surface compared to cleaved InAs(110) h ave been studied by Auger and UV photoelectron spectroscopy. Sputterin g modifies the surface electronic structure even with 0.5 keV Ar+ ions . In particular, InAs(110) surface states are quenched, while sputter- induced electronic states in the band gap close to the Fermi level are present. After the sputtering process a variation of the In bonding c oordination is observed in the surface and subsurface region while mai ntaining the correct average stoichiometry. Subsequent annealing induc es a reordering process and a light accumulation layer in the subsurfa ce region. (C) 1997 Elsevier Science B.V.