M. Castillejo et al., IR AND UV LASER-INDUCED PHOTOLYSIS OF 2-CHLOROETHENYLSILANE, Journal of photochemistry and photobiology. A, Chemistry, 110(2), 1997, pp. 107-113
The laser-induced decomposition of 2-chloroethenylsilane was studied i
n the IR with a TEA CO2 laser and in the UV with a narrow-band, freque
ncy-doubled dye laser at 212.5 nm. Silylene was observed in the LR mul
tiphoton dissociation (MPD) via laser-induced fluorescence (LIE). The
nascent silylene fragments are vibrationally excited in the bending mo
de. Multiphoton UV photolysis yields a fluorescence emission spectrum
originating from the SiH (A(2) Delta --> (XII)-I-2) Delta upsilon = 0
system, with several atomic Si transitions and molecular bands corresp
onding to C-2 (d(3)II(g) --> a(3)II(u)) Delta upsilon = 2, 1, 0, -1 an
d -2 transitions. The simulation of the spectra originating from diato
mic fragments indicates that these possess a high content of internal
energy, A high population of Si triplet states is observed. (C) 1997 E
lsevier Science S.A.