INDUCED GATE NOISE IN MOSFETS REVISITED - THE SUBMICRON CASE

Citation
Dp. Triantis et al., INDUCED GATE NOISE IN MOSFETS REVISITED - THE SUBMICRON CASE, Solid-state electronics, 41(12), 1997, pp. 1937-1942
Citations number
8
Journal title
ISSN journal
00381101
Volume
41
Issue
12
Year of publication
1997
Pages
1937 - 1942
Database
ISI
SICI code
0038-1101(1997)41:12<1937:IGNIMR>2.0.ZU;2-C
Abstract
At high frequencies the gate admittance of the MOSFET contains a condu ctive component because of the capacitive coupling of the gate electro de to the channel. The thermal noise fluctuations, originating in the channel, induce a gale current outwards from the gate electrode. Based on a proved two-region model for the drain current noise of a sub-mic ron MOSFET, it is shown that the calculated gate-noise current increas es significantly, compared to that predicted by a classical model, val id for long channel devices. (C) 1997 Elsevier Science Ltd.