E. Jedryka et al., STRUCTURE OF CO LAYERS IN CO CU MULTILAYERS AT THE FIRST ANTIFERROMAGNETIC MAXIMUM STUDIED BY NUCLEAR-MAGNETIC-RESONANCE/, Journal of applied physics, 81(8), 1997, pp. 4776-4778
Using Co-59 nuclear magnetic resonance, a structural study has been pe
rformed on a series of Co/Cu multilayers with Cu thickness of 9 Angstr
om (corresponding to the first maximum of antiferromagnetic coupling)
and Co thickness varying between 10 and 50 Angstrom. The structure of
the Co layer is fee for small Co thicknesses. With increasing Co thick
ness, a rapid increase of hcp Co content is observed, particularly for
samples between 10 and 30 Angstrom Co. The equivalent thickness of th
e deposited Co involved in the mixed interface planes is estimated to
be a total of about 5 Angstrom for both interfaces of the Co layer. Th
e interface maintains a relatively sharp concentration profile similar
to that observed in samples at the second maximum of antiferromagneti
c coupling. However, a certain degree of topological disorder in the i
nterface is introduced by the onset of hcp stacking. (C) 1997 American
Institute of Physics.