CrO2 films were deposited on Al2O3 and TiO2 by high-pressure decomposi
tion of CrO3. They are metallic, with a residual resistivity po in the
range 0.2-10 mu Omega m. The resistivity below T-c varies as p(o) + a
lpha T-2 + beta T-7/2, expected for a correlated fully spin-polarized
d band. At T-c the resistivity changes slope but the sign remains posi
tive. There is a small negative magnetoresistance (similar to 0.5%/ T)
in a wide temperature range below T-c. Coercivity of the films varies
according to the substrates from 7 mT for Al2O3 (110) to 15 mT for Ti
O2 (110). (C) 1997 American Institute of Physics.