PROCESS SIMULATION FOR THE 1990S

In this paper, an outlook on future aspects of process simulation is g iven. The main direction for ongoing research is simulation in three s pace dimensions. For modern devices, all three spatial coordinates mus t be obeyed in process simulation, to provide sufficiently accurate do ping profiles and device geometry for three-dimensional device simulat ion and, therefore, to predict the electric behaviour of the device re alistically. Some new techniques to circumvent current limitations in three-dimensional process simulations are depicted. Aspects of process now representation for future automatic process optimization are disc ussed.