B. Baccus et E. Vandenbossche, MODELING HIGH-CONCENTRATION BORON-DIFFUSION WITH DYNAMIC CLUSTERING -INFLUENCE OF THE INITIAL CONDITIONS, Microelectronics, 26(2-3), 1995, pp. 235-242
Boron diffusion and activation at high concentrations are key problems
in the formation of shallow P+ junctions. Therefore, it is necessary
to understand and to predict accurately the dopant behaviour under the
se conditions. In this paper, the modelling of boron is discussed, by
the use of a non-equilibrium point-defect model, including amorphizati
on and a dynamic clustering component. The initial conditions are of m
ajor importance, not only for the transient enhanced diffusion, but al
so for the amount of active dopants. As a result, it is possible to ob
tain activation levels greater than the solid solubility, as observed
experimentally.