EFFECT OF TRACE WATER ON THE FILM FORMATION ON NICKEL ANODE

Authors
TASAKA A TSUKUDA Y OHASHI T YAMADA S MATSUSHITA K KOHMURA A MURAMATSU N TAKEBAYASHI H
Citation
A. Tasaka et al., EFFECT OF TRACE WATER ON THE FILM FORMATION ON NICKEL ANODE, Denki Kagaku Oyobi Kogyo Butsuri Kagaku, 65(12), 1997, pp. 1086-1090
Citations number
7
Journal title
Denki Kagaku Oyobi Kogyo Butsuri Kagaku → ACNP
ISSN journal
03669297
Volume
65
Issue
12
Year of publication
1997
Pages
1086 - 1090
Database
ISI
SICI code
0366-9297(1997)65:12<1086:EOTWOT>2.0.ZU;2-5
Abstract
The effects of trace water in NH4F . 2HF melt at 100 degrees C on the formation rate and the physico-chemical properties of oxidized layer o n the Ni anode were studied. The potentiodynamic and potentiostatic po larization behaviors of the Ni anode were investigated to elucidate th e anodic processes. The overall anodic current and the current loss ca used by nickel dissolution at the potential range higher than 4.75 V w ere decreased by a trace of water in the melt, presumably due to the f ormation of dense oxide layer.