EVALUATION OF SURFACE CONTAMINATION OF TITANIUM DENTAL IMPLANTS BY LV-SEM - COMPARISON WITH XPS MEASUREMENTS

Citation
M. Morra et C. Cassinelli, EVALUATION OF SURFACE CONTAMINATION OF TITANIUM DENTAL IMPLANTS BY LV-SEM - COMPARISON WITH XPS MEASUREMENTS, Surface and interface analysis, 25(13), 1997, pp. 983-988
Citations number
22
ISSN journal
01422421
Volume
25
Issue
13
Year of publication
1997
Pages
983 - 988
Database
ISI
SICI code
0142-2421(1997)25:13<983:EOSCOT>2.0.ZU;2-Z
Abstract
Low-voltage scanning electron microscopy (LV-SEM) was used to monitor contamination by carbonaceous compounds on the surface of two differen t commercially available titanium dental implants. Because of its high er surface sensitivity, the LV mode allows us to image contaminating m aterials on surfaces that are undetected by conventional SEM. Results stemming from LV-SEM observations were compared to surface composition data obtained by XPS analysis. A good relationship between findings o btained by the two techniques was found. (C) 1997 John Wiley & Sons, L td.