MAGNETRON SPUTTER-DEPOSITION AND CHARACTERIZATION OF TI TIN, AU/TIN AND MOSX/PB MULTILAYERS/

Pure TiN and MoSx, as well as Au/TiN, Ti/TiN and MoSx/Pb multilayers ( multilayer layer thickness 4-50 nm), have been prepared by magnetron s puttering at room temperature. The characteristics of these films have been investigated using atomic force microscopy, X-ray diffraction an d reflection, Auger depth profiling and Rutherford backscattering. The wear properties of the films have been determined using pin-on-disc m easurements and the hardness of the films have been examined using nan oindentation techniques. Results show that the mechanical properties d epend on multilayer thickness and that oxygen contamination from the b ackground vacuum result in a degradation of film performance. (C) 1997 Elsevier Science S.A.