P. Siemroth et al., VACUUM-ARC EVAPORATION WITH PROGRAMMABLE EROSION AND DEPOSITION PROFILE, Surface & coatings technology, 94-5(1-3), 1997, pp. 592-596
An advanced vacuum dc-arc evaporation unit, consisting of a broad area
flat cathode and a computer controlled array of magnetic coils, is de
scribed, It is shown that such a magnetic amy can control the erosion
area within well defined pattern. The system is useful for increasing
the cathode-lifetime due to prevention of inhomogeneous erosion, Moreo
ver, the programable are evaporation unit can be used to solve special
deposition problems, for example deposition with a predefined thickne
ss profile. On the other hand it can be used to increase the area of h
omogeneous deposition. The system was tested on industrial deposition
plants and is now available. (C) 1997 Elsevier Science S.A.