VACUUM-ARC EVAPORATION WITH PROGRAMMABLE EROSION AND DEPOSITION PROFILE

Citation
P. Siemroth et al., VACUUM-ARC EVAPORATION WITH PROGRAMMABLE EROSION AND DEPOSITION PROFILE, Surface & coatings technology, 94-5(1-3), 1997, pp. 592-596
Citations number
8
ISSN journal
02578972
Volume
94-5
Issue
1-3
Year of publication
1997
Pages
592 - 596
Database
ISI
SICI code
0257-8972(1997)94-5:1-3<592:VEWPEA>2.0.ZU;2-Y
Abstract
An advanced vacuum dc-arc evaporation unit, consisting of a broad area flat cathode and a computer controlled array of magnetic coils, is de scribed, It is shown that such a magnetic amy can control the erosion area within well defined pattern. The system is useful for increasing the cathode-lifetime due to prevention of inhomogeneous erosion, Moreo ver, the programable are evaporation unit can be used to solve special deposition problems, for example deposition with a predefined thickne ss profile. On the other hand it can be used to increase the area of h omogeneous deposition. The system was tested on industrial deposition plants and is now available. (C) 1997 Elsevier Science S.A.