INVESTIGATION OF THE USEFULNESS OF A SOFT-X-RAY LENS FOR LITHOGRAPHY

Authors
WANG DC LIU YC YAN YM FU JQ
Citation
Dc. Wang et al., INVESTIGATION OF THE USEFULNESS OF A SOFT-X-RAY LENS FOR LITHOGRAPHY, Journal of trace and microprobe techniques, 15(4), 1997, pp. 663-667
Citations number
2
Journal title
Journal of trace and microprobe techniques → ACNP
ISSN journal
07334680
Volume
15
Issue
4
Year of publication
1997
Pages
663 - 667
Database
ISI
SICI code
0733-4680(1997)15:4<663:IOTUOA>2.0.ZU;2-0
Abstract
The application to X-ray lithography of a parallel beam lens composed of monocapillaries has been investigated. The lens characteristics hav e been measured. The results show that, for the assembled lens, a larg e printing field can be obtained and uniformity of intensity distribut ion within this area can be easily reached to the level of 90%. Furthe r improvement for increasing lens transmission efficiency is necessary .