Triode discharges are widely used in plasma assisted physical vapour d
eposition techniques to enhance ionisation even under low pressures. I
n addition to this, the triode discharges enable independent control o
f substrate bias currents irrespective of bias voltage and pressure, c
ompared to magnetron discharges. One of the problems associated with t
riode discharge is non-uniform distribution of plasma density. The ext
ent of non-uniformity depends on the size of the chamber, characterist
ics of the thermionic filament, location of the electrodes with respec
t to one another, operating potentials at the electrodes, and pressure
. Hence it is necessary to carry out the discharge studies to study sp
ace charge distribution in the chamber. A Langmuir probe is used in th
e present study, to estimate the density of ions and electrons for dif
ferent triode discharge currents, substrate bias voltages, pressures a
nd at different locations in the plasma in a triode ion plating system
. It has been observed that the uniformity of the density of the charg
e carriers depends on the operating conditions. (C) 1997 Elsevier Scie
nce Ltd. All rights reserved.