IN-SITU GROWTH OF SRTIO3 THIN-FILMS PREPARED BY AACVD FROM STRONTIUM AND TITANIUM-OXIDE BISDIPIVALOYLMETHANATES

Authors
PENA J MARTINEZ A CONDE F GONZALEZCALBET JM VALLETREGI M
Citation
J. Pena et al., IN-SITU GROWTH OF SRTIO3 THIN-FILMS PREPARED BY AACVD FROM STRONTIUM AND TITANIUM-OXIDE BISDIPIVALOYLMETHANATES, Solid state ionics, 101, 1997, pp. 183-190
Citations number
21
Journal title
Solid state ionics → ACNP
ISSN journal
01672738
Volume
101
Year of publication
1997
Part
1
Pages
183 - 190
Database
ISI
SICI code
0167-2738(1997)101:<183:IGOSTP>2.0.ZU;2-3
Abstract
Single phase SrTiO3 thin films were prepared from strontium and titani um oxide bisdipivaloylmethanate (dpm) by a MOCVD-derived spray pyrolys is method. First, the deposition behaviour of SrO-SrCO3 films obtained from Sr(dpm)(2) and that of TiO2 films from TiO(dpm)(2) were separate ly studied, in order to optimize the conditions to deposit SrTiO3 film s. The films were deposited in a wide temperature range (600-900 degre es C) onto different substrates and characterized by X-ray powder diff raction, scanning electron microscopy (SEM) and energy dispersive spec troscopy (EDS).