TESTING THE FRICTIONAL-PROPERTIES OF MOO3 THIN-FILM SURFACE WITH AFM - A NANOSCOPIC LEVEL INVESTIGATION

Citation
H. Klein et al., TESTING THE FRICTIONAL-PROPERTIES OF MOO3 THIN-FILM SURFACE WITH AFM - A NANOSCOPIC LEVEL INVESTIGATION, Surface review and letters, 4(5), 1997, pp. 1031-1034
Citations number
7
Journal title
ISSN journal
0218625X
Volume
4
Issue
5
Year of publication
1997
Pages
1031 - 1034
Database
ISI
SICI code
0218-625X(1997)4:5<1031:TTFOMT>2.0.ZU;2-X
Abstract
In this study we have realized alpha-MoO3 thin film synthesis, mainly under the (110) orientation, and performed their frictional study usin g an AFM to obtain values of friction coefficients mu. This technique appears to be a good way for the investigation of the frictional prope rties at the microscopic scale. Indeed we can mark the difference betw een two crystalline states of MoO3 by their frictional properties.