TEMPERATURE-DEPENDENCE OF MAGNETORESISTANCE IN SPIN VALVES WITH DIFFERENT THICKNESSES OF NIO

Citation
Ch. Lai et al., TEMPERATURE-DEPENDENCE OF MAGNETORESISTANCE IN SPIN VALVES WITH DIFFERENT THICKNESSES OF NIO, Journal of applied physics, 81(8), 1997, pp. 3989-3991
Citations number
8
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
81
Issue
8
Year of publication
1997
Part
2A
Pages
3989 - 3991
Database
ISI
SICI code
0021-8979(1997)81:8<3989:TOMISV>2.0.ZU;2-1
Abstract
Spin valves with structure X Angstrom NiO/60 Angstrom NiFe/30 Angstrom Cu/80 Angstrom NiFe/50 Angstrom Ta, with X from 250 to 1450, were fab ricated by de magnetron sputtering, and their magnetoresistances and N iO/NiFe exchange fields were measured over the temperature range from 20 to 200 degrees C. Delta R/R decreased almost linearly with increasi ng temperature from 20 degrees C up to a transition temperature, and t hen decreased more steeply to zero at. the blocking temperature, A bro ad distribution of NiO/NiFe exchange paths was observed peaking around 70 degrees C. The Delta R/R transition temperatures and the exchange path distributions were dependent on NiO thickness. Part of the reduct ion of Delta R/R at high temperatures may be attributed to fluctuation s in NiO spin orientation which cause imperfect antiparallel alignment of the magnetizations of the NiFe layers. (C) 1997 American Institute of Physics.