Ch. Lai et al., TEMPERATURE-DEPENDENCE OF MAGNETORESISTANCE IN SPIN VALVES WITH DIFFERENT THICKNESSES OF NIO, Journal of applied physics, 81(8), 1997, pp. 3989-3991
Spin valves with structure X Angstrom NiO/60 Angstrom NiFe/30 Angstrom
Cu/80 Angstrom NiFe/50 Angstrom Ta, with X from 250 to 1450, were fab
ricated by de magnetron sputtering, and their magnetoresistances and N
iO/NiFe exchange fields were measured over the temperature range from
20 to 200 degrees C. Delta R/R decreased almost linearly with increasi
ng temperature from 20 degrees C up to a transition temperature, and t
hen decreased more steeply to zero at. the blocking temperature, A bro
ad distribution of NiO/NiFe exchange paths was observed peaking around
70 degrees C. The Delta R/R transition temperatures and the exchange
path distributions were dependent on NiO thickness. Part of the reduct
ion of Delta R/R at high temperatures may be attributed to fluctuation
s in NiO spin orientation which cause imperfect antiparallel alignment
of the magnetizations of the NiFe layers. (C) 1997 American Institute
of Physics.