SIMULATIONS OF SPUTTERING INDUCED ROUGHENING AND FORMATION OF SURFACE-TOPOGRAPHY IN DEPOSITION OF AMORPHOUS DIAMOND FILMS WITH MASS SEPARATED KILOELECTRONVOLT ION-BEAMS
I. Koponen et al., SIMULATIONS OF SPUTTERING INDUCED ROUGHENING AND FORMATION OF SURFACE-TOPOGRAPHY IN DEPOSITION OF AMORPHOUS DIAMOND FILMS WITH MASS SEPARATED KILOELECTRONVOLT ION-BEAMS, Journal of applied physics, 82(12), 1997, pp. 6047-6055
Atomic scale simulations are performed for ion bombardment induced rou
ghening of amorphous diamond films in a process where deposition is do
ne by using kiloelectronvolt mass separated ion beams operated in the
upper limit of practical deposition energies up to 20 keV. Resulting s
urfaces are shown to be self-affine and they have low surface roughnes
s. The experimentally observed extremely low roughness is obtained whe
n moderate surface relaxation within the distance of next nearest neig
hbors is taken into account in simulations. It is found that there is
also another mechanism, originating from the ballistic movement of red
eposited atoms, which can maintain the eroding surfaces smooth. High-e
nergy, off-normal deposition is shown to lead in pattern formation on
a mesoscopic scale. (C) 1997 American Institute of Physics.