TRANSPORT-PROPERTIES OF NI-WS2 PHOTOCONDUCTIVE THIN-FILMS

Citation
O. Lignier et al., TRANSPORT-PROPERTIES OF NI-WS2 PHOTOCONDUCTIVE THIN-FILMS, Journal of applied physics, 82(12), 1997, pp. 6110-6115
Citations number
41
Journal title
ISSN journal
00218979
Volume
82
Issue
12
Year of publication
1997
Pages
6110 - 6115
Database
ISI
SICI code
0021-8979(1997)82:12<6110:TONPT>2.0.ZU;2-R
Abstract
It is shown that the annealing under Ar of sputtered WSx amorphous fil ms deposited on Ni coated substrates gives bidimensional polycrystalli ne 2H-WS2 films. Ni enhances the formation of large crystallites. The temperature dependence of the mobility and its dependence versus the N i content clearly show that transport properties are governed by grain boundaries. A basic grain boundary model like the model of Seto is we ll suited to explain the electrical properties. The photoconductivity enhancement resulting from nickel is assigned to a decrease of the num ber of the electrical barriers. However, noise measurements are not co nsistent with Hall measurements; a model is thus proposed to explain t he 1/f noise excess in relation to the traces of Ni-W revealed by x-ra y diffraction. (C) 1997 American Institute of Physics.