Wf. Egelhoff et al., OXYGEN AS A SURFACTANT IN THE GROWTH OF GIANT MAGNETORESISTANCE SPIN VALVES, Journal of applied physics, 82(12), 1997, pp. 6142-6151
We have found a novel method for increasing the giant magnetoresistanc
e (GMR) of Co/Cu spin valves with the use of oxygen. Surprisingly, spi
n valves with the largest GMR are not produced in the best vacuum. Int
roducing 5x10(-9) Ton (7x10(-7) Pa) into our ultrahigh vacuum depositi
on chamber during spin-valve growth increases the GMR, decreases the f
erromagnetic coupling between magnetic layers, and decreases the sheet
resistance of the spin valves. It appears that the oxygen may act as
a surfactant during film growth to suppress defects and to create a su
rface which scatters electrons more specularly. Using this technique,
bottom spin valves and symmetric spin valves with GMR values of 19.0%
and 24.8%, respectively, have been produced. These are the largest val
ues ever reported for such structures. (C) 1997 American Institute of
Physics.