RESPONSE OF 100-PERCENT INTERNAL QUANTUM EFFICIENCY SILICON PHOTODIODES TO 200 EV-40 KEV ELECTRONS

Electron irradiation of 100% internal quantum efficiency silicon photo diodes having a thin (60 Angstrom) SiO2 dead layer results in measured responsivities ranging from 0.056 A/W at an incident electron energy E-0 = 0.2 keV to 0.24 A/W at E-0 = 40 keV, By comparing the data to a Monte Carlo simulation of electron interactions with the photodiode ov er an energy range of 1-40 keV, we derive an average electron-hole pai r creation energy of 3.71 eV, in close agreement with other studies. A nalysis of electron energy lost to processes that do not contribute to electron-hole pair creation shows that the energy lost in the SiO2 de ad layer is dominant for E-0 < 1.5 keV, whereas the energy removed by backscattered electrons is dominant for E-0 > 1.5 keV, At E-0 = 300 eV , the Monte Carlo simulation results show that the electron projected range is significantly less than the dead layer thickness even though the measured response is 0.082 A/W, indicating that electron-hole pair s generated in the oxide dead layer are collected by the junction.