ADVANCED VACUUM-ARC METAL-ION IMPLANTATION SYSTEMS

The economics of using standard semiconductor-type, mass separated ion beams, for non-electronic, industrial applications are prohibitive. T n this article a new cathodic are metal ion implantation system design ed specifically for industrial applications is presented. The system f eatures multiple cathodic are pulsed ion sources powered by a single p ower supply and pre-programmed and controlled by computer. Unlike any previous system, this new advanced vacuum are ion source (AVIS) system operates with four separate ion sources, all driven simultaneously fr om a single power supply and computer control system. Each ion source is capable of generating a time averaged current in excess of 100 mA; it includes six cathodes and generates a rectilinear beam spot 500 mm by 1000 mm at a distance of 2000 mm from the source. The operator can choose which of 24 cathodes (6 per source) to operate, arranged in up to three sequences. The system fires the cathodes sequentially until a preset level for the sequence is achieved, then switches to the next sequence. This process can be repeated in incremental steps to facilit ate multi-element implants. A further unique feature of the advanced v acuum are ion sources is that the cathodes are connected to step motor s. During operation, the computer feeds the cathodes continuously, all owing the system to operate for extended periods. (C) 1997 Elsevier Sc ience S.A.