REPETITIVELY PULSED VACUUM-ARC ION AND PLASMA SOURCES AND NEW METHODSOF ION AND ION-PLASMA TREATMENT OF MATERIALS

A brief review is presented of the ''Raduga 1-5'' repetitively pulsed vacuum are ion sources. Their operating principles and functional rang es are described. The Raduga ion sources provide single-and multi-elem ent implantation. These advantages are achieved by using not only pure single-element or mixed ion beams, but also pulsed beam sequences wit h controllable composition and energy of each ion species. Another fea ture of the ion sources is their ability to generate a sequence of ion beam and plasma stream pulses. Switching between ion implantation and plasma deposition can be done from pulse to pulse, within each pulse, or after accumulation of a required dose. ''Raduga 5'' ion and plasma source operates in a d.c. mode of plasma formation and repetitively p ulsed mode of ion beam generation. A new simple and effective system f or filtering a plasma flux from the microparticle fraction and the neu tral component is described. (C) 1997 Elsevier Science S.A.