UTILIZATION OF PLASMA SOURCE ION-IMPLANTATION FOR TRIBOLOGICAL APPLICATIONS

Citation
R. Gunzel et al., UTILIZATION OF PLASMA SOURCE ION-IMPLANTATION FOR TRIBOLOGICAL APPLICATIONS, Surface & coatings technology, 96(1), 1997, pp. 16-21
Citations number
37
ISSN journal
02578972
Volume
96
Issue
1
Year of publication
1997
Pages
16 - 21
Database
ISI
SICI code
0257-8972(1997)96:1<16:UOPSIF>2.0.ZU;2-2
Abstract
Plasma source ion implantation (PSII) has been developed as an alterna tive technique to circumvent the limitations of conventional ion impla ntation. such as the requirements of complicated target handling and b eam raster systems for a uniform ion implantation of three-dimensional samples. By applying negative high voltage pulses, positively charged ions are accelerated to and implanted into the target. The plasma she ath expansion and ion doses, calculated with a theoretical model, are in good agreement with the experimentally obtained data. As the analyt ical model describes the experimental data sufficiently, it is used to discuss design specifications for PSII systems. Furthermore, the poss ibility of implanting ions into large, three-dimensional samples is di scussed on the basis of predictions of the analytical model. The resul ts of nitrogen PSII treatment of planar samples are shown. Wear and ha rdness of the implanted and unimplanted flat steel samples with a high chromium content were measured. An increased hardness as well as a de creased wear was obtained. (C) 1997 Elsevier Science S.A.