Computer simulation results are reported on transistor design and sing
le-event charge collection modeling of metal-semiconductor field effec
t transistors (MESFETs) fabricated in the Vitesse H-GaAsIII(R) process
on Low Temperature grown (LT) GaAs epitaxial layers. Tradeoffs in Sin
gle Event Upset (SEU) immunity and transistor design are discussed. Ef
fects due to active loads and diffusion barriers are examined.