The electronic structure of n-i-p-i Si superlattices is investigated b
y the tight-binding renormalization method. Strong anistropy of the ho
le masses in the in-plane direction is found and strong localization o
f the electron and hole wave-functions in the growth direction is repo
rted. For the structure studied, a type-II configuration is found with
nearly zero overlap between electron and hole wave-functions. The lat
ter property is discussed in view of its possible device applications.