MOS CAPACITOR HOLDING TIME AND DIFFUSION LENGTH AT DRAM REFRESH TEST TEMPERATURE

Citation
A. Bouhdada et J. Oualid, MOS CAPACITOR HOLDING TIME AND DIFFUSION LENGTH AT DRAM REFRESH TEST TEMPERATURE, Microelectronics, 26(5), 1995, pp. 405-412
Citations number
12
Categorie Soggetti
Engineering, Eletrical & Electronic
Journal title
ISSN journal
00262692
Volume
26
Issue
5
Year of publication
1995
Pages
405 - 412
Database
ISI
SICI code
0026-2692(1995)26:5<405:MCHTAD>2.0.ZU;2-B
Abstract
In this paper, we show that the minority-carrier diffusion length in t he neutral region of MOS capacitors can be measured using some refinem ents to the original method given by D.K. Schroder [2] even at tempera tures for which the leakage current is not exclusively due to the diff usion current. This is the case at the temperature used for the test o f DRAM refresh time (80-85 degrees C). For this temperature, we have v erified that the MOS capacitor holding time is a linear function of th e minority carrier diffusion length.