2-STAGE PHOTOQUENCHING IN AU-SI DIODE WITH NATIVE-OXIDE LAYER ILLUMINATED BY INTENSE LIGHT

Authors
Citation
Wi. Hamdi, 2-STAGE PHOTOQUENCHING IN AU-SI DIODE WITH NATIVE-OXIDE LAYER ILLUMINATED BY INTENSE LIGHT, Journal of materials science. Materials in electronics, 8(6), 1997, pp. 419-425
Citations number
15
ISSN journal
09574522
Volume
8
Issue
6
Year of publication
1997
Pages
419 - 425
Database
ISI
SICI code
0957-4522(1997)8:6<419:2PIADW>2.0.ZU;2-W
Abstract
The effect of intense white light on the current-voltage characteristi cs of an Au/Si diode has been investigated. A two-stage photoquenching transient effect can clearly be identified in the forward and reverse directions. This phenomenon may be due to a trap (surface or deep tra p) undergoing a transition into a metastable state upon exposure to in tense light, inducing a lattice strain. This effect is further studied at low temperature; the general shape of photovoltage versus illumina tion time is preserved, but the trap-filling process of the two-stage transient speeds up, producing shorter transitions and higher saturati on levels.