M. Digiulio et al., GAS-SENSING PROPERTIES OF SPUTTERED THIN-FILMS OF TUNGSTEN-OXIDE, Journal of physics. D, Applied physics, 30(23), 1997, pp. 3211-3215
Electrical, structural and morphological properties of thin films of W
O3 deposited by the reactive RF sputtering method have been analysed.
The fundamental electrical features of WO3 have been determined by Hal
l-effect measurements. Information about the structure and morphology
of these films was obtained by transmission electron microscopy techni
ques. The investigations of electrical properties in a controlled atmo
sphere at various operating temperatures revealed that WO3 is particul
arly suitable for NO gas detection. In particular, the relative variat
ion of the resistance of WO3 was found to be reversible and to follow
a power-law relationship. The dependence of the electrical properties
on the structure and morphology has also been discussed.