PBTIO3 THIN-FILMS ON SI(100) AS POTENTIAL VARISTOR MATERIAL

Citation
Vr. Palkar et al., PBTIO3 THIN-FILMS ON SI(100) AS POTENTIAL VARISTOR MATERIAL, Applied physics letters, 71(25), 1997, pp. 3637-3639
Citations number
13
Journal title
ISSN journal
00036951
Volume
71
Issue
25
Year of publication
1997
Pages
3637 - 3639
Database
ISI
SICI code
0003-6951(1997)71:25<3637:PTOSAP>2.0.ZU;2-M
Abstract
We have shown that the aqueous sol derived thin films of PbTiO3 on Si( 100) substrate exhibit strong varistor type of behavior for certain an nealing conditions. Current-voltage (I-V) characteristics depend upon the processing conditions. The behavior is explained by grain boundary limited conduction model. Since the resistance of the grain boundarie s varies with the processing conditions, grain boundaries in all sampl es do not act as potential barriers to the charge carriers. The film p ostannealed at 700 degrees C, possessing high nonlinear coefficient (a lpha) with low breakdown voltage per barrier (E-gbl), could be used as a protection device in current-sensitive electronic equipment. (C) 19 97 American Institute of Physics. [S0003-6951(97)04151-X].