BORON IMPLANTATION DOPING OF DIAMOND

Citation
B. Ittermann et al., BORON IMPLANTATION DOPING OF DIAMOND, Applied physics letters, 71(25), 1997, pp. 3658-3660
Citations number
15
Journal title
ISSN journal
00036951
Volume
71
Issue
25
Year of publication
1997
Pages
3658 - 3660
Database
ISI
SICI code
0003-6951(1997)71:25<3658:BIDOD>2.0.ZU;2-8
Abstract
Spin polarized B-12 nuclei were produced in B-11(d,p)B-12 nuclear reac tion and recoil implanted into a type Ib diamond sample at doses below 10(11) cm(-2). beta-radiation detected nuclear magnetic resonance spe ctra were measured directly after implantation at sample temperatures ranging from 300 to 800 K. The polarization asymmetry at the Larmor re sonance yielded fractions of boron ions at sites of full tetrahedral s ymmetry of 12(1)% at 300 K, increasing to 17(2)% at 800 K. It is argue d that these boron atoms are incorporated substitutionally by direct r eplacement collisions during the implantation process, The resonance s pectra also showed additional boron at low-symmetry sites. (C) 1997 Am erican Institute of Physics. [S0003-6951(97)01551-9].