EFFECTS OF SEED LAYERS ON THE CHARACTERISTICS OF (PB,LA)(ZR,TI)O-3 THIN-FILMS PREPARED BY ELECTRON-CYCLOTRON-RESONANCE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION

The effects of seed layers on the characteristics of La-doped lead zir conate titanate (PLZT) thin films prepared by electron cyclotron reson ance plasma enhanced chemical vapor deposition (ECR PECVD) were invest igated. The seed layers used were lead oxide, titanate, lead titanate and La-doped lead titanate. PLZT films with stoichiometric composition and perovskite single phase were fabricated using titanate, lead tita nate and La-doped lead titanate as seed layers. Among them, PLT was th e most effective seed layer in regard to surface morphology, crystalli nity and electrical properties of the PLZT films. The effects of seed layers were very remarkable on the Pt/SiO2/Si substrate, however, less significant on the Pt/Ti/SiO2/Si substrate because the Ti atoms out-d iffused from the Ti underlayer to the substrate surface and exhibited seed-like characteristics for the formation of perovskite phase nuclei .