HIGH-PERFORMANCE GAINASSB THERMOPHOTOVOLTAIC DEVICES WITH AN ALGAASSBWINDOW

Citation
Hk. Choi et al., HIGH-PERFORMANCE GAINASSB THERMOPHOTOVOLTAIC DEVICES WITH AN ALGAASSBWINDOW, Applied physics letters, 71(26), 1997, pp. 3758-3760
Citations number
12
Journal title
ISSN journal
00036951
Volume
71
Issue
26
Year of publication
1997
Pages
3758 - 3760
Database
ISI
SICI code
0003-6951(1997)71:26<3758:HGTDWA>2.0.ZU;2-A
Abstract
A large increase in the quantum efficiency (QE) and open-circuit volta ge V-oc of GaInAsSb thermophotovoltaic (TPV) devices is obtained by th r use of an AlGaAsSb window layer compared with devices without a wind ow layer. The TPV structure, grown on GaSb substrates by organometalli c vapor phase epitaxy or molecular beam epitaxy, consists of a 1-mu m- thick n-GaInAsSb base layer, a 3-mu m-thick p-GaInAsSb emitter layer, a 100-nm-thick AlGaAsSb window layer, and a 25-nm-thick GaSb contactin g layer, The band-gap energy of the lattice-matched GaInAsSb is 0.53-0 .55 eV. The peak internal QE of the TPV cells with the window is > 90% , compared with less than 60% for those without the window. At a short -circuit current density of similar to 1000 mA/cm(2), V-oc of similar to 300 meV is obtained for cells with the window layer, compared with less than 220 meV without the window layer. These increases are attrib uted to a substantial decrease in the surface recombination velocity w ith the window layer. Based on a standard calculation, the electron di ffusion length in the p-GaInAsSb layer is at least 5 mu m. (C) 1997 Am erican Institute of Physics. [S0003-6951(97)03252-X].