We describe a new technique that incorporates polarization modulation
into near-field scanning optical microscopy (NSOM) for nanometer scale
polarimetry studies. By using this technique, we can quantitatively m
easure the optical anisotropy of materials with both the high sensitiv
ity of dynamic polarimetry and the high spatial resolution of NSOM. Th
e magnitude and relative orientation of linear birefringence or linear
dichroism are obtained simultaneously. To demonstrate the sensitivity
and resolution of the microscope, vee map out stress-induced birefrin
gence associated with submicrometer defects at the fusion boundaries o
f SrTiO3 bicrystals, Features as small as 150 nm were imaged with a re
tardance sensitivity of similar to 3 x 10(-3) rad. (C) 1998 Optical So
ciety of America.