CONTROL OF SPUTTERING IN A MODIFIED MAGNETRON-TYPED RADIOFREQUENCY DISCHARGE

Authors
LI YL IIZUKA S SATO N
Citation
Yl. Li et al., CONTROL OF SPUTTERING IN A MODIFIED MAGNETRON-TYPED RADIOFREQUENCY DISCHARGE, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 132(4), 1997, pp. 585-588
Citations number
8
Categorie Soggetti
Instument & Instrumentation","Nuclear Sciences & Tecnology","Physics, Atomic, Molecular & Chemical
Journal title
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms → ACNP
ISSN journal
0168583X
Volume
132
Issue
4
Year of publication
1997
Pages
585 - 588
Database
ISI
SICI code
0168-583X(1997)132:4<585:COSIAM>2.0.ZU;2-F
Abstract
In a modified magnetron-typed radio-frequency (RF) discharge plasma, t he sheath potential in front of the RF electrode is controlled by vary ing the magnetic field configuration and strength around the RF electr ode, which gives rise to a big change of particle sputtering from the RF electrode. The relation between the RF electrode potential and the plasma potential is quite different from that in the conventional capa citively coupled RF discharges, being responsible for a drastic decrea se in the sputtering. (C) 1997 Elsevier Science B.V.