NANOSTRUCTURE FABRICATION BY REACTIVE-ION ETCHING OF LASER-FOCUSED CHROMIUM ON SILICON

We have fabricated chromium nanostructures on silicon by laser-focused atomic deposition and have further processed these structures by reac tive-ion etching in an SF6 plasma. We show that the result can be an a rray of parallel wires as narrow as 68 nm or an array of parallel Si t renches as narrow as 85 nm. The laser-focused deposition process is in herently parallel, so a large area is patterned simultaneously with an accurate periodicity of 212.78 nm. This method represents a novel way to make large, coherent arrays of sub-100 nm-size structures.