M. Cappadonia et al., IN-SITU X-RAY SURFACE DIFFRACTION OF COPPER UNDERPOTENTIAL DEPOSITIONON AU(100), Journal of electroanalytical chemistry [1992], 436(1-2), 1997, pp. 73-78
In order to investigate the copper underpotential deposition (upd) on
gold single crystals, X-ray surface diffraction (XRSD) measurements we
re performed under in-situ conditions. After formation of a complete C
u upd layer, Cu was found to adsorb in a commensurate p(1 x 1) structu
re in fourfold hollow sites with a vertical distance of 1.4 Angstrom f
rom the Au(100) surface. The coverage obtained by XRSD was (65 + 8)%.
The structure of the Cu upd layer was studied as a function of applied
potential and of the Cu-ion concentration in solution. The Cu-ion con
centration did not affect the structure of the Cu upd layer. As a func
tion of the applied potential, it was possible to investigate the form
ation of the Cu upd layer by XRSD. From a comparison between the XRSD
results and the cyclic voltammetry, the formation of an ionic adlayer
is inferred for the Cu upd on Au(100) in perchloric acid. (C) 1997 Els
evier Science S.A.