MIRAGE-EFFECT-BASED DEPTH PROFILING OF MICROMACHINED SILICON STRUCTURES

Authors
TULI S BHATTACHARYYA AB FORGET BC FOURNIER D
Citation
S. Tuli et al., MIRAGE-EFFECT-BASED DEPTH PROFILING OF MICROMACHINED SILICON STRUCTURES, Sensors and actuators. A, Physical, 64(3), 1998, pp. 203-207
Citations number
11
Categorie Soggetti
Engineering, Eletrical & Electronic","Instument & Instrumentation
Journal title
Sensors and actuators. A, Physical → ACNP
ISSN journal
09244247
Volume
64
Issue
3
Year of publication
1998
Pages
203 - 207
Database
ISI
SICI code
0924-4247(1998)64:3<203:MDPOMS>2.0.ZU;2-6
Abstract
A non-contact, non-destructive technique for the depth profiling of mi cromachined structures is presented. Based on the mirage or optical-be am deflection method of photothermal spectroscopy, an experimental mea surement of a 8 mu m step in silicon is given by way of illustration. (C) 1998 Elsevier Science S.A.