An investigation of MOS transistor mismatch is undertaken and a method
ology is developed for optimizing mis-match without increasing layout
area. Dramatic improvements of up to 300% in matching can be realized
by selecting the optimum W/L ratio without changing the overall WL are
a product, The theoretical basis for the obtainable improvements is fu
lly described and an expression is derived and verified by experiment
to predict the W/L ratio which gives optimum matching.