MASS-LIMITED, DEBRIS-FREE LASER-PLASMA EUV SOURCE

The development of a laser-plasma EUV line emission source based on fr ozen water droplet targets which is essentially debris-free and capabl e of continuous, high-repetition-rate (> 1 kHz) operation is described . Created by modest (< 1 J) laser energies, this plasma produces copio us emission at 13 and 11.6 nm, the preferred wavelengths for EUV proje ction lithography, with negligible target operation costs. (C) 1998 El sevier Science B.V.