Nanocrystalline diamond thin films have been synthesized in an Ar-CH4
microwave discharge, without the addition of molecular hydrogen. X-ray
diffraction, transmission electron microscopy, and electron energy lo
ss spectroscopy characterizations show that the films consist of a pur
e crystalline diamond phase with very small grain sizes ranging from 3
to 20 nm. Atomic force microscopy analysis demonstrates that the surf
aces of the nanocrystalline diamond films remain smooth independent of
the film thicknesses. Furthermore, the reactant gas pressure, which s
trongly affects the concentration of C-2 dimer in the Ar-CH4 plasma as
well as the growth rate of the films, has been found to be a key para
meter for the nanocrystalline diamond thin film depositions. (C) 1998
American Institute of Physics.