NDBA2CU3OX-AU-NDBA2CU3OX PROXIMITY-EFFECT JUNCTION WITH A DECANANO-SCALE TRENCH FABRICATED USING A HIGH-RESOLUTION FOCUSED ION-BEAM TECHNIQUE

We have fabricated NdBa2Cu3OX-Au-NdBa2Cu3OX proximity-effect junctions using a high-resolution focused gallium-ion beam (FIB) technique with a full width of half maximum of 10 nm. These bridge-type junctions ha ve characteristics such as a decanano-scale trench for the bridge form ed using the etching function of FIB, and a precise contact area defin ed using the deposition function of FIB. The current-voltage character istics of the junctions are qualitatively consistent with a resistivel y shunted junction model.