The effects of cleaning on the near-surface composition of Corning Cod
e 1737 glass was studied. Cleaned glass substrates were found to devel
op a thin silica-rich surface layer approximately 6 nm thick formed by
chemical leaching. The presence of this layer was verified by X-ray p
hotoelectron spectroscopy, scanning transmission electron microscopy a
nd X-ray scattering. Atomic force microscopy measurements of the glass
before and after cleaning showed no increase in the surface roughness
. Top-gated polycrystalline silicon thin film transistors fabricated o
n cleaned substrates had leakage currents, similar to those on substra
tes with deposited SiO2 layers. (C) 1997 Elsevier Science B.V.